This paper describes the study on the component and structure of the silicon oxide and silicon nitride films by infra-red absorbed spectrum. 利用红外吸收谱等微观分析对氧化硅和氨化硅薄膜的成分和结构进行了研究。
Besides, thin-film silicon technologies have also been developed to place a thin film of amorphous or microcrystalline silicon onto flat large-area substrates such as glass. 另外，薄膜硅技术也被开发出来，将非晶硅或者微晶硅薄膜放到玻璃那样的平的大面积衬底上。
