Tungsten films may be deposited by the hydrogen reduction of tungsten hexafluoride. 采用氟化物氢还原的方法制备钨涂层。
It has been pointed out that catalytic hydrogenation of nitrobenzene and its organo-electrochemical reduction is a new technique which has a great future. 提出硝基苯催化加氢还原和有机电解还原是有前景的新工艺。
